Semitron® MPR1000 is a new engineering material developed by Mitsuibishi Chemical Advanced Materials for semiconductor applications. MPR stands for maximum plasma resistance. It is intended for use in vacuum plasma chambers to replace ceramics and quartz for ICU production. Ceramics are more expensive and quartz is prone to break. It also performs better in this application than PEEK, PAI such as Torlon® or polyimide thermoplastics. For example MRP1000 has an increased life in plasma chambers of up to 25X in ozone than polyimides such as Vespel®.
Parts made from MPR1000 include screws, clamp rings, trench rings, pins and shower heads as well as centering pins, focus rings, insulators, vacuum pads and wafer guides.
Pros of Semitron® MPR1000
Excellent heat resistance
Low erosion rate in plasma chambers
Low ionic content and low out-gassing
Excellent chip resistance
Lowest cost plastic material that also provides the highest performance in plasma chambers
What is Plasma?
Plasma is often described as the fourth state of matter because it is neither a liquid, a gas nor a solid. It exists in the form of ions and electrons. In essence, plasma is an ionized gas electrified with extra electrons both negative and positive. While plasma does exist elsewhere in the universe, there is little that occurs naturally here on earth. Examples of plasma on our planet are lightening, static electricity and auroras.
Why Treat a Surface with Plasma?
Plasma treatment of the surface of a silicon wafer is usually done for cleaning, surface activation, deposition and etching. Treatment of surfaces with plasma removes any foreign contaminants therefore making them more suitable for further processing.
Plasma treatment of a surface is usually done in a chamber from which the air has been evacuated. A gas then flows into the chamber at low pressure. Usually industrial oxygen is used as the process gas hence the commonly known phrase “oxygen rich plasma.” But Nitrogen, Argon, Hydrogen and Carbon Tetrafluoromethane are also often used. These gases or a combination of them are used in the majority of labs worldwide. Semitron MPR1000 can withstand these harsh environments better than traditional materials: quartz, ceramics, Torlon®, Vespel® or PEEK.
The gas is then energized by radio frequency power that has been generated between an array of electrodes. The result is plasma. By selecting the gas mixture, pressure and power the effect of the plasma treatment on the surface can be precisely controlled.
Low Erosion Rate
When compared to the percentage of weight loss in oxygen rich plasma Semitron® MPR1000 out-performs PEEK, Torlon® and Vespel®. MPR1000 erodes by .44% in 1KW. PEEK loses 7.98% while Torlon erodes by 6.86% and Vespel by 6.15%. MPR1000 performs 13X better than Vespel.
Cleaniness: Low Ionic Material Content and Low Out-gassing
Semitron® MPR1000 has a low ionic material content and low out-gassing. An ion is an atom or molecule that carries an electric charge. Therefore contaminates from the material in the Vacuum Plasma Chamber will be low.
Semitron® MPR1000 is lower in overall cost than other materials commonly used while providing the highest performance in plasma chambers.
Prints, parts or problems? Contact us at Craftech Industries, Inc. Hudson, NY.